Semiconductor > Deposition Equipment > Plasma-Therm LAPECVD™

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New Product For Sale Listings New Product: Plasma-Therm LAPECVD™

Posted: Saturday, September 1, 2012    Location: St Petersburg, Florida, USA , 33716

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  • Company Name: Plasma-Therm
  • Location: St Petersburg, Florida, USA , 33716
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Ad Details - #419052
Plasma-Therm LLC - LAPECVD™
  • Make: Plasma-Therm LLC
  • Model: LAPECVD™
  • Description: Plasma-Therm LAPECVD™ - Large Area Plasma Enhanced Chemical Vapor Deposition The LAPECVD™ platform can be used to deposit a variety of ... Read More
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Plasma-Therm
LabX Member since January 2010.
In business since 1980.

Plasma-Therm LLC is the global technological leader for providing thin film etch and plasma deposition equipment to a number of high tech market segments and industries. These customer focused solutions are used in areas ranging from university R&D to high volume production.
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Ad Description

Plasma-Therm LAPECVD™ - Large Area Plasma Enhanced Chemical Vapor Deposition

The LAPECVD™ platform can be used to deposit a variety of thin film materials with its parallel-plate plasma deposition system.

Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high volume production in a wide range of applications.

The LAPECVD™ platform can be used to deposit a variety of thin film materials with its parallel-plate plasma deposition system.

Hardware

  • Cassette-to-Cassette Handling
         - Multi substrate batch processing

  • Dual cassettes

  • Platen heating up to 350°C

  • Upper electrode RF power at 13.56 MHz with optional MFD

  • Up to 8 channels with digital MFCs

  • Thermally managed reactor design—up to 175°C for internal walls and shower head

Endpoint
Integrated multifunctional endpoint capability with EndpointWorks.

  • Unique OEI application for real-time film thickness and rate monitoring.

  • OES for optimized chamber clean.

Software

  • User friendly software

  • Comprehensive data logging

  • Automated cleaning program

  • Real-time process data display

  • Fully integrated endpoint system

  • Factory automation compatible (SECS/GEM)

  • Edit recipes during runs

  • Multiple user access levels

  • Alarm history

Process

  • Stress control

  • High uniformity

  • Low damage

  • Low particulates

  • Tunable index

  • Increased productivity with batch loading capability

  • Low temperature

 More info about the Plasma-Therm LAPECVD™