New Product: New DENBEQ Corp. DG150WW 6" Wafer Washer

Brand New DENBEQ Corp. Model DG150WW 6" Wafer Washer For Sale.

Manually Loaded Automatic Cleaning System.

Features:

· Microprocessor based processes controller with LCD screen.

· Easy to navigate on screen menus.

· Digitally programmed wash and dry time parameters.

· Adjustable spin speed control.

· Wash spray pressure up to 2500 psi.

· Cylinder actuated sweep arm with adjustable speed and travel.

· N2 dry with IR heat lamp eliminates all residual water.

· Large IR heat lamp shield stays cool to the touch.

· Splash guard prevents contamination.

· Large opening for easy access to load and unload substrate.

· Interchangeable spin chucks - standard or custom designs.

· Chuck vacuum, N2 pressure, exhaust and cover safety interlocks.

· External house drain and exhaust.

· Small footprint - custom enclosures available.

Applications

  · Accommodates substrates mounted on

     film frames, tape rings or un-mounted

  · Film frames for round substrates up to

    6” (150mm)    

  · Square substrates up to 6” x 6”

    (150mm x 150mm)

  · Typical system applications:

   - Wafer cleaning after dicing

   - Photo-mask cleaning

   - Thin Film substrate cleaning

   - Wafer flux cleaning (flip chip)

System Specifications Model DG150WW

PROCESS CONTROL SYSTEM

Reciprocating Sweep Arm

· Wash spray and N2 dry are integrated into single arm

· Interchangeable nozzles for different spray volume

· Cylinder actuated sweeping movement

· Adjustable sweep speed, travel start and stop locations

Washing System

· Adjustable spray pressure up to 2500 psi

· Pressure release dump valve prevents nozzle drips

Drying System

· Adjustable N2 dry pressure

· IR heat lamp 250 Watt

Spin motor

· Direct drive spindle with DC motor

· Spin speed 100 to 3,600 rpm

Inter Changeable Chucks (Customer Specified)

· Film frame chucks with alignment pins. Vacuum hold down

of substrate and centrifugal pendulum clamps for frame

· Un-mounted substrate chucks with vacuum hold down

· O-ring chucks for photo masks

SOFTWARE

PLC Processes Controller

· Time programmable wash and dry steps (2 Steps)

· Timing Range 1 to 999 seconds (1 second increments)

· Plain English on screen operation prompts and errors

· Easy to navigate on screen menus for programming processes parameters

Facilities and Specifications:

*Requirements may vary depending on process

More info on the New DENBEQ Corp. DG150WW 6" Wafer Washer For Sale