KLA-Tencor - Manufacturer Listings

Please select a listing from those listed below.

1. KLA-Tencor Multi-Purpose Large Chamber SEM
2. Used Condenser Objective Module KLA-Tencor 740-393663-000
3. Used RL Relay Module KLA-Tencor 740-393659-004 760-334637-005
4. Used RF Bench KLA-Tencor SLX RF Bench Assy 740-336864-001
5. KLA-TENCOR 7700 Patterned Wafer Contamination Analyzer
6. P15
7. FLX-2908
8. "Used KLA-Tencor 6420 Surfscan KLA 6420 Surfscan for Non-Patterned wafers, Capable of 3"" -8"" wafers, Low angle optics,Standard OEM puck,0.10 micron defect Sensitivity @ 95% capture on bare silicon, based on PSL standards,accuracy
9. Used KLA-Tencor Flexus 2320 Thin Film Stress measurement system. Windows based PC, monitor & keyboard. Temperature capable of up to 600 degrees C. 208V, single phase
10. "Used KLA-Tencor 2401 Automated Macro-Defect Inspection Serial number N2401-0728 Brightfield/darkfield macro-defect inspection system Captures broadest range of defect types 50m or larger, including whole-wafer defects After-develop inspection and pho
11. "Used KLA-Tencor 7700M Previously owned model 7700 Surfscan system w/ Microscope review station Capable of up to 200mm wafers System will be configured per your wafer size Patterned & Unpatterned Surface Inspection System Can detect as small as 0.15 m
12. Used KLA-Tencor 6400 Surfscan KLA 6400 Surfscan for Non-Patterned wafers, Capable of 3"" -8"" wafers, Low angle optics,0.10 micron defect Sensitivity @ 95% capture on bare silicon, 0.02 ppm Haze Sensitivity, Accuracy within 1%, Argon La
13. "Used KLA-Tencor P11 Long Scan Profiler Scan length: 8.1 inches Scan speed: 1 um/sec to 25mm/sec Sampling rate: 50,100,200,500,1000 sample/sec. Nominal Vertical Linearity: +/-0.5% above 2000A Measurement Head Stylus control: Programmable force range 1
14. "Used KLA-Tencor 4500 Surface Contamination Analyser Model # 4500 Non-patterned wafer inspection capable of up to 6 wafers (150mm) Will Configure for 2 wafers capabilities, including 2 pan assembly, realignment, calibration, cassette elevator modifica
15. "Used KLA-Tencor AIT1 High Throughput Scanning Patterned wafer Defect Inspection system for 100mm-200mm wafers, sensitivity 0.10um latex spheres on bare silicon and patterned process wafers,high speed air bearing stage, new 30mW Argon laser @488nm, Te
16. "Used KLA-Tencor 6200 Wafer Inspection Surfscan System Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Blue light laser for Non-Patterned Surface Inspection System 0.117 micron Defect Sensitivity @ 95% capture
17. Used KLA-Tencor Swift Station Computer for 7700s
18. "Used KLA-Tencor Quantox KLA-Tencor Quantox 64100 Wafer capability of 4 - 12"" (300mm), Options include: Quick Map, Lifetime, Bulk Recombination, Gate Film Oxide, Software Rev. # 3.2, SECS II/ GEM Communication Interface PC Anywhere Software
19. "Used KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0
20. "Used KLA-Tencor 6100 Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity @ 95% capture, based on PSL Standards 0
21. Used KLA-Tencor 4000 Model 4000 Surfscan
22. AIT 1
23. UV-1080
24. KLA-TENCOR P2 PROFILOMETER, LONG SCAN, , 200mm Configuration, can be changed to 100-150mm (Not With System), Chuck Compatable 100mm, 125mm, 150mm, 200mm Wafers, Manf. 5/92
25. KLA-TENCOR ALPHA STEP 200 PROFILOMETER
26. KLA-TENCOR ALPHA STEP 300 PROFILOMETER
27. KLA-TENCOR RS55 RESISTIVITY MAPPER, 50mm – 200mm Wafers, <5 mohm/sq to >5 Megohm/sq Measurement Range, Typical Measurement Time: 3.5 – 4.5 Seconds per Test Site, <0.2% (1 sigma) Measurement Repeatability, PC Based System Controller 25 MHz 486 Based MPU, X
28. SM300
29. P11