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Semiconductor > Metrology and Inspection    (334 Ads Listed)
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SEM Gold Sputtering System 6" diameter glass chamber with 1 3/4 SEM sample stage
Ad LV28896592
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KLA UV1250SE thin film measurement and UV Spectrospoic Ellipsometry system. This system is the ultimate single-solution tool which simultaneously measure film thickness, refractive index, ex ...
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Model 4000 Surfscan
Ad LV28567812
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Surface Contamination Analyser Model # 4500 Non-patterned wafer inspection capable of up to 6 wafers (150mm) Will Configure for 2 wafers capabilities, including 2 pan assembly, realignment, ...
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Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity ...
Ad LV28896616
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Surfscan Capable of up to 200mm wafers Currently configured for 200mm wafers with PA-172 cassettes Red light laser for Non-Patterned Surface Inspection System 0.15 micron Defect Sensitivity ...
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KLA 6220 Surfscan, Capable of 2" -8" wafers. Currently configured for 200mm wafers, PA-1182 Cassettes. Non-patterned surface Inspection System. 0.12 micron Defect Sensitivity @ 95% ...
Ad LV28567800
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KLA 6420 Surfscan for Non-Patterned wafers, Capable of 3" -8" wafers, Low angle optics,Standard OEM puck,0.10 micron defect Sensitivity @ 95% capture on bare silicon, based on PSL standards, ...
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KLA 6420 Surfscan for Non-Patterned wafers, Capable of 3" -8" wafers, Low angle optics,Standard OEM puck,0.10 micron defect Sensitivity @ 95% capture on bare silicon, based on PSL ...
Ad LV28896601
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KLA-Tencor 7600 Particle Inspection Station, Capable of up to 200mm wafers, for Patterned Surface Inspection System. Argon Laser, 208V/60Hz
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Patterned Wafer Inspection sytem Capable of up to 300mm wafers Multiple Spot Optics (5,7 & 10 um)Advanced Collection Optics Configureration, Internal Microscope,AutoFocus Capability,Automati ...
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KLA Tencor AIT UV Automated Darkfield Defect Inspection station for Pattern Wafers,More powerfull and greater Sensitivity than previous AIT XP and AIT 2 station,includes 3 Spot Sizes,Standar ...
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High Throughput Scanning Patterned wafer Defect Inspection system for 100mm-200mm wafers, sensitivity 0.10um latex spheres on bare silicon and patterned process wafers,high speed air bearing ...
Ad LV28896613
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Thin Film Stress measurement system. Windows based PC, monitor & keyboard. Temperature capable of up to 600 degrees C. 208V, single phase
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KLA-Tencor Quantox 64100 Wafer capability of 4 - 12" (300mm), Options include: Quick Map, Lifetime, Bulk Recombination, Gate Film Oxide, Software Rev. # 3.2, SECS II/ GEM Communication ...
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Computer for 7700s
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Leitz microscope, Objectives: (NPI 5x/NPL 10x/NPL 20x/NPL 50x/PI 80x, 8"x 8" stage, bottom light source
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Hg CV plotter Model 466
Ad LV28567813
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Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard film types including photoresists, polyimides, polysilicon, oxides, and nitrides in ...
Ad LV28896622
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Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard film types including photoresists, polyimides, polysilicon, oxides, and nitrides in ...
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