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Price: Request Price Quote
SPTS MULTIPLEX ICP AOE consisting of: - Model: Multiplex AOE (Advanced Oxide Etch)- Currently Configured for 6"/150mm Wafers- Capable of processing up to 8"/200mm wafers- Inductively Coupled ...
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Ad LV29115286
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Price: Request Price Quote
SPTS MPX ICP SR ETCHER consisting of: - Model: MPX PRO ICP- Process: SiC, III-V, or Metal Etch- Single process chamber with manually loaded vacuum loadlock, with carousel wafer handler 2 wa ...
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Ad LV28999617
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Price: Request Price Quote
SPTS MPX ICP SR ETCHER consisting of:
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Ad LV29115287
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Price: Request Price Quote
SPTS MULTIPLEX ICP SR ETCHER consisting of: - Model: MESC ICP- Process SiC, III-V, or Metal Etch- Single process chamber with manually loaded vacuum loadlock - Inductively Coupled Plasma Sou ...
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Ad LV29115288
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Price: Request Price Quote
SPTS VPX PECVD SYSTEM consisting of: - Model: VPX PECVD - 1 x PECVD source- Brooks MX400 Cluster Core- 1 x Vacuum Cassette Station - Setup for 8"/200mm wafers - Process: PECVD- Cassette to ...
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Ad LV28999619
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Model SP150 Quartz Barrel Plasma Asher/Desum, 300W, 13.56Mhz, Single gas input, Quartz Chamber 10" diameter x 18" long, front load, 9" x 16" planar electrode 120V, 60Hz, ...
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Ad LV28896648
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Axic PlasMaster RIE System,Manual load system, non-Load Lock,Fullly automated RIE system with computer control,CRT and Keyboard,SST Chamber. 12" Water Cooled Electrode,(4) MFCs,Balzers ...
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Ad LV28567789
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Parallel plate electrode for an Axic HF8 etcher, including backplate & connectors.
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Ad LV28567922
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Table Top Barrel Plasma Desum & Etching system for up to 8" wafers. Applications: photo resist stripping, descum, Surface modifications, substrate cleaning, anisotropic & Isotropic etch ...
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Ad LV28896649
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Branson ICP Asher, Model L3100/3, 12" diameter chamber, 3000C Controller
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Ad LV28567868
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Model R3A Low Frequency Plasma Cleaner PLC controlled - PE1000 power supply -500 W system, capable of up to 8 sample trays - 14" x 14", (2)Two 14" x 14" electrodes which ...
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Ad LV28896557
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LAM Alliance A-6 Platform, (1) LM/TM with dual end effector, (1) Wafer Pre-aligner, (2) 4526 Oxide Etch modules with ESC chucks & (1) 9400 DSiE module with ESC chucks
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Ad LV28896651
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March CS-1701 Plasma RIE system, (Reactive Ion Etch),Clam shell manual load 8 inch lower electrode, configured for up to an 8" diameter,four MFCs currently set up for CF4, Ar,CHF3, O3 with N ...
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Ad LV28567887
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March Quartz Barrel Asher/etcher,300W RF generator,chamber dia. 5.50" x 6.0" deep, single gas input with flow controller, digital panel
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Ad LV28567909
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Matrix Asher Moderate and low temperature Resist Strip and Cleans, >35 wph Wafer sizes: up to 6" Cassette to Cassette Heated chuck, magnet card reader
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Ad LV28896560
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Reactive Ion Etcher Load lock & main process chamber 6 MFCs -(BCl3, Cl2, CH4, H2, Ar, O2),Pfeiffer Turbo TPH330PC on the Main chamber,Pfeiffer Turbo TMH 260C on the Load Lock,Leybold mechani ...
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Ad LV28896563
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Plasmatherm 790 RIE (Reactive Ion Etcher),Manual load,non-load lock,11" lower electrode, EN 600W RF power supply with matchwork and tuner,Leybold 361C turbo with NT20 controller,Four MFCs (C ...
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Ad LV28567903
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Plasmatherm/Unaxis VLR ICP Cassette to Cassette System, (1) LM/TM module single load lock with single endeffector, (1) ICP Bosch module, currently set up for 100mm wafers with ESC chucks,ENI ...
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Ad LV28567898
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Versalock RIE System with (1) LM/TM module (2) RIE module - 5 MKS Mass Flow Controllers (O2, CL2, Ar,CF4,CHF3) RFPP-RF10S RF power supply, Leybold DryVac 50P Leybold 361C turbo with NT20 con ...
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Ad LV28567703
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Plasmatherm Dual Chamber Reactive Ion Etcher/PECVD, Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” RIE substrate electrode, MKS 286 Flow Cont ...
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Ad LV28567890
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PIasmaSTAR® 200
A Unique Modular Approach to Barrel Plasma Processing
The PlasmaSTAR® Seri... Read More
SPEC 3510E PC Isotropic Etch System
SPEC Equipment has developed the new GaSonics ... Read More
Convert multi-step sulfated ashing to an automated one-step process.
Sulfated ashing techniques hav... Read More
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