|
|
|
Plasmatherm Dual Chamber Reactive Ion Etcher/PECVD, Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11” RIE substrate electrode, MKS 286 Flow Cont ...
|
Ad LV28567890
|
|
|
|
|
PC operated 7000 PECVD system 32" upper electrode (5) MFCs - MKS 1479A - N2 purge,NF3- 2000sccm,N2-1000sccm,He-5000sccm,NH3-50sccm,SiH4-2000sccm,RF20S power supply w/matching network, P ...
|
Ad LV28896566
|
|
|
|
|
Shuttlelock 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPPRF5S RF power supply w/AM5, Six zone heater,VAT PM5 Pressure Controller, RF10M w/phase ...
|
Ad LV28567682
|
|
|
|
|
Shuttlelock 770 ICP (Ion Coupled Plasma)Etcher, Load Lock Shuttle Lock transfer, Single chamber ICP,RFPPRF5S RF power supply w/AM5, Six zone heater,PM5 Pressure Controller, RF20M w/phase,He ...
|
Ad LV28567693
|
|
|
|
|
Plasmatherm 700 series Reactive Ion etcher (RIE) System perfect for Research & Spectrometry studies,Parallel plate type RIE - 11" Upper electrode & 9" lower electrode,Multi-wafer s ...
|
Ad LV28567684
|
|
|
|
|
RIE (Reactive Ion Etch) System w/endpoint detector. 8" electrode,RIE (lower electrode only) RFPP - RF5S power supply, Leybold 151C turbo, Neslab/RTE 111 Chillers, (6) MKS MFCs, Non-Clor ...
|
Ad LV28567695
|
|
|
|
|
Plasmatherm 790 RIE, 700 series Aluminum Chamber without load lock, 11" bottom electrode,Gas panel with (3) MFCs-(2)N2,(1)Cl2,Adnanced Energy RFPP-RF5S RF power supply with AM5 matching ...
|
Ad LV28567686
|
|
|
|
|
6" Table Top RIE model number 6" RIE MF RFPP - RF5S 500 watt @ 13.56 mHz power supply & AM5 6" chuck w/ showerhead (3) MFCs - MKS Type 1160B all 100 sccm 208V, 60Hz
|
Ad LV28896573
|
|
|
|
|
Cassette to Cassette Reactive Ion Etcher, Load Lock chamber w/Leybold 360 turbo,Leybold NT150/260 controller,Process chamber with 11" electrode,Advanced Energy RFPP-RF5S/AM5 matching ne ...
|
Ad LV28896568
|
|
|
|
|
Plasmatherm Dual Chamber Reactive Ion Etch (RIE), Dual 700 style Alumimum chambers with Load lock, 11 inch lower electrode on both chambers, Advanced Energy RFPP RF5S RF power supply with AM ...
|
Ad LV28567792
|
|
|
|
|
Dual Chamber Reactive Ion Etcher/PECVD Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11 RIE substrate electrode, MKS 286 Flow Controller, (2)MKS ...
|
Ad LV28896576
|
|
|
|
|
Shuttlelock Dual Chamber 770 ICP (Ion Coupled Plasmaer)Etcher, Load Lock Shuttle Lock transfer, RFPPRF5S RF power supply w/AM5, Six zone heater,PM5 Pressure Controller, RF20M w/phase,Model 9 ...
|
Ad LV28896574
|
|
|
|
|
Dual Chamber Reactive Ion Etch (RIE), Dual 700 style Alumimum chambers with Load lock, 11 inch lower electrode on both chambers, Advanced Energy RFPP RF5S RF power supply with AM5 matching n ...
|
Ad LV28567683
|
|
|
|
|
Reactive Ion Etcher Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11 RIE substrate electrode and upper showerhead electrode,Z80 controller (upgr ...
|
Ad LV28896572
|
|
|
|
|
Reactive Ion Etcher Plasma Shuttle-Lock load-lock loading system with platen transfer Model 700 Al Chamber with 11 PC - Window based system. Advanced Energy RFPP 500 watt RF generator with m ...
|
Ad LV28896564
|
|
|
|
|
Plasmatherm ECR microwave etcher Astex model AX2100 -1000W Micorwave generator,Astex 27V, 185 amp ECR power supply, Astex 20V, 125amp ECR power supply,currently set up for 2-8" wafers,Neslab ...
|
Ad LV28567891
|
|
|
|
|
Plasmatherm ECR microwave etcher Astex model AX2100 -1000W Micorwave generator,Astex 27V, 185 amp ECR power supply, Astex 20V, 125amp ECR power supply,currently set up for 2-8" wafers,N ...
|
Ad LV28567702
|
|
|
|
|
Plasmatherm ICP(Ion Coupled Plasma) Etcher Load Lock Shuttle Lock transfer, Model 770,Single chamber ICP, Watlow heater, RFPP RF5S & 20M power supply, 8.31electrode, 6" Electrostatic C ...
|
Ad LV28896580
|
|
|
|
|
Plasmatherm ICP(Ion Coupled Plasma) Etcher Load Lock Shuttle Lock transfer, Model 770,Single chamber ICP, Watlow heater, RFPP RF5S & 20M power supply, 8.31electrode, 6" Electrostatic C ...
|
Ad LV28896581
|
|
|
|
|
Plasmatherm VLR ICP Cassette to Cassette LM/TM with dual end-effectors,(3)VLR ICP module,Configured for 6" dia. wafer with Clamp, PM1 & PM2 configuration:(8) MFCs,VAT PM5 Throttle valve ...
|
Ad LV28567793
|
|
PIasmaSTAR® 200
A Unique Modular Approach to Barrel Plasma Processing
The PlasmaSTAR® Seri... Read More
SPEC 3510E PC Isotropic Etch System
SPEC Equipment has developed the new GaSonics ... Read More
The PYRO-XL includes all the design features of the PYRO.
In addition, the PYRO-XL includes a quart... Read More
Follow us on Twitter