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ICP Cluster System, BOC process, Standard rate etch ICP Process module only New, installed but never turned on (1) Multiplex ICP process module Low pressure Plasma processing chamber Inducti ...
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Ad LV28567719
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STS ICP High Rate (ASE) Advanced Silicon Etch system,He backside cooling,ENI 300/30 Watt(13.56MHz) RF power supply,Advanced Energy 3kWatt matching network,Leybold Mag200CT,Huber 140W chiller ...
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Ad LV28896586
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Standard RIE (Reactive Ion Etch) MESC Multiplex,Intellimetrics end-point detector,ENI ACG3G 300/30 watt(13.56 MHz) RF power supply & matching network,6" configuration, non-clamp system ...
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Ad LV28896584
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Technics 200E stripper/processor - Microwave 13.56Hmz,8.5" round chamber x 9" deep,vent and one gas,gas distribution via quartz tubes, rotometer,timer, 220 V 10A, 50Hz
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Ad LV28896590
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Technics 220-II Barrel Plasma Asher, 300 Watt 13.56 MHz Power Supply, (3)Three Gas Channels with Mass Flow controllers,Stainless Steel Chamber Process up to 4? Dia. Substrates
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Ad LV28567781
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Table top system for parallel plate plasma processing, 17" diameter work surface/electrode, (Low Frequency 30 KHz RF power supply,(4) Four MFCs process gas control - (3) of which are 10 ...
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Ad LV28896589
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Table Top barrel Asher, High Frequency type with 13.56 W RF power supply and matching network. 2 gas channels, 115V 50/60 Hz.
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Ad LV28567721
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Table top system for parallel plate plasma processing ENI OEM 12A -300 Watt, 13.56 MHz Solid State power supply, with Trazar Corp. matching network. (3) Three MFCs process gas control - (2) ...
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Ad LV28896588
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PC controlled Table top system for parallel plate plasma processing,Advanced Energy 300 W RF power supply with matchbox,(3) Three MFCs process gas control - (2) of which are 100sccm & (1) of ...
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Ad LV28896612
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Microwave Plasma Etcher Applications Photoresist stripping Mask Etching Surface Cleaning Etching of Glass and ceramics Etching of SiO2, Si3N4, Si Removal of Polyimid and passivation layer Pr ...
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Ad LV28567730
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Tepla 600 cassette to cassette load RF Barrel Asher, Plasma Chamber:Quartz, Diameter 245 mm, Depth 380 mm,1000W ENI 13.56 MHz RF power supply,w/ automatic impedance matching, Edwards gate va ...
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Ad LV29318230
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Plasmatherm VLR ICP Cassette to Cassette System, (1) LM-TM: Single Load lock with single end effector, (2) VLR ICP modules,Configured for 150mm wafer with ESC chuck,PM1 & PM2 configuration: ...
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Ad LV28567896
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Dual Stack Spin Rinse Dryer Verteq Controller,Right side door hinge, GFI breakers, 120V, 60 Hz, 15 A
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Ad LV28567736
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Model R3 Low Frequency Plasma Cleaner, Sequential microprocessor which allows up to 90 separate one or two gas programs. YES 500 Watt power supply - model number CLF 500/50, two gas inputs w ...
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Ad LV28567739
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Features: Wafer capability up to 8" RF generator model PM119 Two process gas capability Process prgrammer: Model PM906U-44b Specifications: Barrel asher chamber size: 10"W x 23& ...
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Ad LV28907589
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Description: Branson/IPC Mod. S2100-11220 Reactor Center Features: One 12" (Diamter) x 20" (D) quartz chamber Three channel controller with three rotometer gas flow controllers B ...
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Ad LV28907579
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Description: Dual quartz chambers for 100-150mm wafers, cassette to cassette operation. Features: Automatic pick-and-place wafer handling Automatic pneumatic soft-lift assemblies for each c ...
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Ad LV28907578
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Description: The 7100 Series is the most popular of the GaSonics International industrial batch treatment and cleaning systems. This full-featured system is based on proven reactor features ...
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Ad LV28907582
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Description: The GaSonics Aura Loadlock Isotropic Etcher (AE-2000LL) is a microprocessor-controlled down-stream etcher that etches the font, and optionally, the backside of a wafer. The AE-2 ...
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Ad LV28907585
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Description: Microwave downstream etcher. Features: Cassette to cassette wafer handling Front and backside etching Variable platen temperature Alumina (ceramic) plasma tube Fluorine compat ...
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Ad LV28907580
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