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Photolithography Sponsors
New Products
Continuous Reflective Interface Sample Placement
Mounts onto any microscope’s stand... Read More
SZ-2000 Stereoscopic Zoom Microscope Automation
Based on ASI’s proven DC servo motor te... Read More
ASI Video Auto-Focus Option
ASI’s video auto-focus provides a simple focus control solu... Read More
Most Category Listings
Most LabVista Listings
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Topside & IR mask aligner Capable of up to 8" wafers, Split field optics - torret type, UV 400 optics, 500 watt lamp mercury short-arc lamp, CIC 1000 power supply
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Ad LV28896558
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Karl Suss MJB3 mask aligner Top side only,505 power supply,Suss normal field microscope, UV300 exposure optics,Suss M400 normal field microscope, Leitz 10x eyepieces,Leitz 5x/10x/20X objecti ...
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Ad LV28567669
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Single Bowl Resist Spinner
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Ad LV28567716
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Features: Auto Feeder: Single, cassette to cassette, backside wafer handling Wafer size: Currently 5" (4" and 3" sizes available) Mask size: Currrently 6" (5" and 4 ...
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Ad LV28907687
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Description: This mirror projection aligner has a single auto-feeder. It is cassette to cassette and also has backside wafer handling. Features: Autofeeder: single, cassette to cassette Bac ...
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Ad LV28907694
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Features: Cassette to cassette mask aligner can be used manually in auto mode Illuminator: USHIO 250W high pressure mercury lamp Mask aligner for 2" - 5" Masks may be used, manual ...
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Ad LV28907688
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Description: The EVG®610 is a highly flexible R&D system that can handle small substrate pieces and wafers up to 200 mm. The tool supports a variety of standard lithography processe ...
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Ad LV28907696
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Description: Known for its high level of automation and reliability, the EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer si ...
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Ad LV28907695
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Description: A photostabilization system with 4" to 6" wafer capability. It's a cost-effective, one-step solution for photoresist stabilization of 75-150mm wafer substrates. Featur ...
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Ad LV28907703
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Description: A photostabilizer with a fully automated, stand-alone, system for unicassette processes. Allows wafer sizes: 100mm to 200mm. Features: Three axis robotic pick and place SEC/GEM ...
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Ad LV28907693
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Description: The Karl Suss MA150 production aligner platform offers a higher overlay accuracy, more flexible wafer handling including reject and buffer cassette option and SECS II/GEM functi ...
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Ad LV28907692
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Features: Capable of wafers up to 8"/200mm Capable of working with wafer masks up to 9" x 9" Automatic mask aligner Configured for top side alignment Ergonomic Cassette plate ...
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Ad LV28907698
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Description: The Karl Suss MA 56 is a mask alignment and exposure system that has highly ecnomonical production capabilities for wafers up to 125mm. It's easy to maintain and can be easily a ...
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Ad LV28907689
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Description: The Karl Suss MA6 / BA6 is exclusively intended for use as an alignment and/or exposure device for substrates used in Semiconductor and Microsystems Technology. Features: Expos ...
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Ad LV28907690
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Description: The Karl Suss MA6 is one of the most reliable mask aligners in the industry with low maintenance cost. It works with substrate up to 150mm in diameter. Features: Consists of ba ...
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Ad LV28907691
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Description: The SUSS MA8 is the system solution for lithography in R & D on substrate sizes up to 200 mm. Widely employed in development and pilot production of IC backend processes, th ...
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Ad LV28907697
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Specifications: Max wafer size: 5" diameter wafers Capable of Hard Contact, Soft Contact, and Proximity Exposure Modes Semi-Automatic operation (Cassette Wafer Load/Unload) 350W Lamph ...
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Ad LV28907700
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Description: The MJB-3s are suitable for handling wafers up to 3 inches in diameter and can be used for other samples. Features: System comes with power supply to control a 350W Hg lamp in ...
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Ad LV28907699
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Description: Designed for maximum versatility, the OAI Model 500 high-resolution mask alignment and exposure system is a high-performance contact mask aligner developed for ultra-precise, s ...
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Ad LV28907702
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Description: The system can process a wide range of materials including glass and ceramic ranging in substrate size from 5mm to 200mm. Features: Mask alignment is performed by adjusting the ...
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Ad LV28907701
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