Discover the PlasmaQuant 9200: High-Resolution ICP-OES


Advanced ICP-OES Technology for Complex Elemental Analysis

Analytik Jena has introduced the PlasmaQuant 9200 series ICP-OES instruments, redefining precision and efficiency in elemental analysis. Designed to handle challenging matrices, including organic samples, this innovative series delivers high-resolution results with superior matrix tolerance.

Ideal for laboratories needing accuracy across a broad range of applications—from metals and ore testing to petrochemicals and battery materials—the PlasmaQuant 9200 combines cutting-edge performance with a remarkably compact footprint.

The standard model offers 6 pm resolution @ 200 nm for routine labs, while the PlasmaQuant 9200 Elite provides an ultra-fine resolution of 2 pm @ 200 nm for more demanding applications.

Key Features of the PlasmaQuant 9200 Series

  • High Spectral Resolution: Up to 2 pm @ 200 nm for complex samples

  • Broad Spectral Range: 160–900 nm, ideal for multi-element analysis

  • Compact Footprint: Only 60 cm wide—over 40 percent smaller than its predecessor

  • Fast Start-Up: Ready for use in under 10 minutes

  • Robust Plasma Source: Handles matrices with up to 1,700 W power

  • Dual View Plus Technology: Enhances precision and reduces repeat testing

  • Modular V Shuttle Torch: Customizable torch configuration for sample flexibility

Whether in quality control or high-throughput labs, the PlasmaQuant 9200 offers reliable performance and space-saving convenience.

This article has been sourced from a press release and may include content created or refined using AI tools and verified by our editorial team. For the full press release, visit: "Analytik Jena Presents New ICP-OES Device Series PlasmaQuant 9200."