High-Resolution SEM-EDS Redefines Materials Analysis

Ultra-high-resolution SEM-EDS for advanced research and quality control

TESCAN introduces the MIRA XR, an ultra-high-resolution scanning electron microscope (SEM) integrated with energy-dispersive X-ray spectroscopy (EDS), designed for rapid and precise materials analysis in both academic and industrial settings. Bridging the gap between conventional field emission SEMs and ultra-high-resolution systems, the MIRA XR offers analytical flexibility, user-friendly operation, and streamlined workflows.

Key Features of the TESCAN MIRA XR

  • BrightBeam™ Technology: Achieves sub-nanometer resolution at low accelerating voltages, enabling detailed imaging of nanoscale structures.

  • Dual Essence™ EDS: Reduces elemental analysis turnaround time by up to 50%, enhancing workflow efficiency.

  • Wide Field Optics™: Speeds up sample navigation by 40%, facilitating quicker identification of regions of interest.

  • MultiVac™ Mode: Allows low-vacuum operation for beam-sensitive and outgassing samples, minimizing the need for extensive sample preparation.

  • In-Flight™ Automation: Simplifies imaging processes, making high-resolution imaging accessible to users of all experience levels.

The MIRA XR is engineered for high-throughput environments, including quality control, metallurgy, battery research, and semiconductor failure analysis, where both speed and imaging accuracy are critical.

This article has been sourced from a press release and may include content created or refined using AI tools and verified by our editorial team. This press release was provided by TESCAN.